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DTSTART;TZID=US/Eastern:20100115T150000
DTEND;TZID=US/Eastern:20100115T160000
SUMMARY:Electrochemical Atomic Layer Deposition (ALD), John Stickney -- 
DESCRIPTION:NanoSEC Seminar. Dr. John Stickney of the University of Georgia Department of Chemistry will presenting his talk "Electrochemical Atomic Layer Deposition (ALD)" this week.Recent results in studies of the formation of compound and metal nanofilms by electrochemical atomic
layer deposition (ALD) will be discussed. ALD is the deposition of materials an atomic layer at a time
using surface limited reactions. Electrochemical surface limited reactions are generally referred to as
underpotential deposition or UPD. By combining UPD and ALD, electrochemical ALD is created.
Historically most electrochemical ALD has been performed in the creation of compound semiconductor
thin films. More recently a number of elemental deposits have been formed by electrochemical ALD, and
a surface limited reaction referred to here as a surface limited redox replacement or SLRR. Recent work
on the formation of compound for photovoltaics, thermoelectrics, and for phase change memory may be
discussed. In addition, recent work on the growth of Pt and Ru nanofilms for fuel cell electrodes may be
described. Deposit characterization involves electron beam microprobe analysis (EPMA) for deposit
stoichiometry. Glancing angle X-ray diffraction for structural characterization, while scanning tunneling
microscopy (STM) was used to characterize the surface morphology. Optical characterization involves
reflection absorption studies as well as photoelectrochemical studies. Optimization studies involve
systematic investigation of the conditions which result in the formation of one compound or elemental
monolayer with each deposition cycle. In general, deposits formed at a rate of one monolayer per cycle or
less show the best structure, stoichiometry and morphology. Nano templates can be used to form
nanoclusters, rods or wires, depending on the number of cycles performed. Superlattices can be formed
by alternating some finite number of cycles for the growth of one compound with a similar number of
cycles of another. X-ray diffraction can then be used to characterize the period of the superlattice.
LOCATION:Auditorium, Riverbend Research Laboratory South
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